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In recent years, the electronics industry has witnessed a significant surge in the use of Polycrystalline Silicon (Poly-Si) based thin-film transistors, particularly in the production of flat-panel displays, solar panels, and other semiconductor devices. However, with the increasing reliance on these technologies, a growing concern has emerged in the form of PVCAD (Poly-Si Channel Architecture Damage) crack. This phenomenon has significant implications for device reliability, performance, and overall lifespan. In this article, we will explore the concept of PVCAD crack, its causes, effects, and potential mitigation strategies. While it may be tempting to search for
